咨詢熱線

13761090949

當前位置:首頁   >  產品中心  >  二維材料  >  六方氮化硼  >  CVD銅基多層氮化硼薄膜(2*2)

CVD銅基多層氮化硼薄膜(2*2)

簡要描述:Multilayer h-BN (Boron Nitride) film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

  • 產品型號:
  • 廠商性質:生產廠家
  • 更新時間:2024-06-03
  • 訪  問  量:1080

詳細介紹

Multilayer h-BN (Boron Nitride) film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Multilayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.

Properties of h-BN

Multilayer h-BN (Boron Nitride) film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Multilayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.

Properties of h-BN

產品咨詢

留言框

  • 產品:

  • 您的單位:

  • 您的姓名:

  • 聯系電話:

  • 常用郵箱:

  • 省份:

  • 詳細地址:

  • 補充說明:

  • 驗證碼:

    請輸入計算結果(填寫阿拉伯數字),如:三加四=7

聯系我們

上海巨納科技有限公司 公司地址:上海市虹口區寶山路778號海倫國際大廈5樓   技術支持:化工儀器網
  • 聯系人:袁文軍
  • QQ:494474517
  • 公司座機:86-021-56830191
  • 郵箱:yuanwenjun@sunano.com.cn

掃一掃 更多精彩

微信二維碼

網站二維碼

给娇妻安排又粗又大玩3